45H-7

Hydrolysis of sorghum straw using hydrochloric acid at 127şC

A. Herrera1, S. J. Téllez-Luis1, J. A. Ramírez1, and M. VÁZQUEZ2. (1) Dept. of Food Science & Technology, Univ. Autónoma de Tamaulipas, U. A. M. Reynosa-Aztlán, Calle 16 y Lago de Chapala, Col Aztlán, Reynosa, Tamaulipas, 88740, Mexico, (2) Department of Analytical Chemistry - Area Food Technology, Universidad de Santiago de Compostela, Escuela Politécnica Superior, Lugo, 27002, Spain

Xylose production can be considered a first step to produce biotechnological food additives such as xylitol or astaxanthin. It is possible to obtain xylose from sorghum straw by acid hydrolysis. The use of xylose to produce biotechnological food additives requires a low concentration of growth inhibitors such as furfural and acetic acid that are byproducts of the hydrolysis reaction.

The objective of this work was to evaluate the hydrolysis of sorghum straw using hydrochloric acid at 127°C to obtain xylose solution with low concentration of microbial growth inhibitors (acetic acid and furfural). Several hydrochloric acid concentrations (2, 4 or 6%) and reaction times (20, 40, 60, 180 or 300 min) were assayed.

Sorghum straw was obtained from a local farm. Moisture was determined gravimetrically, xylose, glucose, arabinose and acetic acid were determined by HPLC with IR detector. Furfural was determined by UV-Vis spectrometry.

The maximum xylose concentration (23.79±0.39 g/L) was obtained with 4% of hydrochloric acid after 40 min of reaction time. In this condition, 2.68±0.17 g glucose/L, 4.19±0.11 g arabinose/L, 0.67±0.49 g furfural/L, 3.15±0.51 g acetic acid/L were also obtained. Degradation reactions were observed after 40 min with a consequent decrease in the xylose concentration.

The results showed that it is possible to obtain xylose solutions with low concentration of growth inhibitor from sorghum straw using hydrochloric acid. Therefore, these solutions supplemented with nutrients can be used as media for biotechnological production of food additives.

Session 45H, International: General
8:30 AM - 12:00 AM, Monday AM

2003 IFT Annual Meeting - Chicago,